https://scholars.lib.ntu.edu.tw/handle/123456789/546427
標題: | Low-Temperature (<40 �Xc) Atmospheric-Pressure Dielectric-Barrier-Discharge-Jet Treatment on Nickel Oxide for p-i-n Structure Perovskite Solar Cells | 作者: | Tsai, J.-H. Hsu, C.-C. JERRY CHENG-CHE HSU JIAN-ZHANG CHEN I-CHUN CHENG |
公開日期: | 2020 | 卷: | 5 | 期: | 11 | 起(迄)頁: | 6082-6089 | 來源出版物: | ACS Omega | 摘要: | A scan-mode low-temperature (<40 °C) atmospheric-pressure helium (He) dielectric-barrier discharge jet (DBDjet) is applied to treat nickel oxide (NiO) thin films for p-i-n perovskite solar cells (PSCs). Reactive plasma species help reduce the trap density, improve the transmittance and wettability, and deepen the valence band maximum (VBM) level. A NiO surface with the lower trap density surface of NiO allows better interfacial contact with the MAPbI3 layer and increases the carrier extraction capability. MAPbI3 can better crystallize on a more hydrophilic NiO surface, thereby suppressing charge recombination from the grain boundary and the interface. Further, the deeper VBM allows better band alignment and reduces the probability of nonradiative recombination. NiO treatment using He DBDjet with a scan rate of 0.3 cm/s can improve PSC efficiency from 13.63 to 14.88%. Copyright © 2020 American Chemical Society. |
URI: | https://www.scopus.com/inward/record.url?eid=2-s2.0-85082068664&partnerID=40&md5=b00b4355c44a69f829e2af7777f9c4d9 https://scholars.lib.ntu.edu.tw/handle/123456789/546427 |
DOI: | 10.1021/acsomega.0c00067 |
顯示於: | 化學工程學系 |
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