https://scholars.lib.ntu.edu.tw/handle/123456789/546699
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Tu, C.-L. | en_US |
dc.contributor.author | Lin, K.-I. | en_US |
dc.contributor.author | Pu, J. | en_US |
dc.contributor.author | Chung, T.-F. | en_US |
dc.contributor.author | Hsiao, C.-N. | en_US |
dc.contributor.author | Huang, A.-C. | en_US |
dc.contributor.author | Yang, J.-R. | en_US |
dc.contributor.author | Takenobu, T. | en_US |
dc.contributor.author | Chen, C.-H. | en_US |
dc.contributor.author | JER-REN YANG | en_US |
dc.creator | Tu, C.-L.;Lin, K.-I.;Pu, J.;Chung, T.-F.;Hsiao, C.-N.;Huang, A.-C.;Yang, J.-R.;Takenobu, T.;Chen, C.-H. | - |
dc.date.accessioned | 2021-02-04T02:27:45Z | - |
dc.date.available | 2021-02-04T02:27:45Z | - |
dc.date.issued | 2020 | - |
dc.identifier.uri | https://www.scopus.com/inward/record.url?eid=2-s2.0-85084379603&partnerID=40&md5=236b4638ae3c611cc7b81830ead1572a | - |
dc.identifier.uri | https://scholars.lib.ntu.edu.tw/handle/123456789/546699 | - |
dc.relation.ispartof | Nanoscale | - |
dc.title | CVD growth of large-area InS atomic layers and device applications | en_US |
dc.type | journal article | en |
dc.identifier.doi | 10.1039/d0nr01104e | - |
dc.identifier.pmid | 32338265 | - |
dc.identifier.scopus | 2-s2.0-85084379603 | - |
dc.identifier.isi | WOS:000534337900004 | - |
dc.relation.pages | 9366-9374 | - |
dc.relation.journalvolume | 12 | - |
dc.relation.journalissue | 17 | - |
item.fulltext | no fulltext | - |
item.cerifentitytype | Publications | - |
item.openairetype | journal article | - |
item.openairecristype | http://purl.org/coar/resource_type/c_6501 | - |
item.grantfulltext | none | - |
crisitem.author.dept | Materials Science and Engineering | - |
crisitem.author.orcid | 0000-0001-7897-7039 | - |
crisitem.author.parentorg | College of Engineering | - |
顯示於: | 材料科學與工程學系 |
在 IR 系統中的文件,除了特別指名其著作權條款之外,均受到著作權保護,並且保留所有的權利。