https://scholars.lib.ntu.edu.tw/handle/123456789/616390
標題: | Improved field-emission properties of carbon nanotube field-emission arrays by controlled density growth of carbon nanotubes | 作者: | Juan C.-P. Chen K.-J. Tsai C.-C. Lin K.-C. Hong W.-K. Hsieh C.-Y. Wang W.-P. Lai R.-L. Chen L.-C. Cheng H.-C. LI-CHYONG CHEN |
關鍵字: | Carbon nanotubes;Density control of CNTs;Inactive thin-film layer | 公開日期: | 2005 | 卷: | 44 | 期: | 1 A | 起(迄)頁: | 365-370 | 來源出版物: | Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 摘要: | The density distribution of CNTs is one of the crucial parameters determing the field-emission property of CNTs. To effectively control the density of CNTs, an inactive thin-film layer was deposited on a catalyst. The results showed that improved field emission property could be obtained with a thin SiO layer on the catalyst layer as the precursor. For 3.5 nm Fe and 3.5 nm SiO on 3.5 nm Fe as a catalyst, the turn-on field could be decreased from 3.7V/μm. to 2.2 V/μm and the field-emission current density increased from 2.6 × 10-8 A/cm2 to 2.4 × 10-4 A/cm 2 when the applied field was 4 V/μm. © 2005 the japan society of applied physics. |
URI: | https://www.scopus.com/inward/record.uri?eid=2-s2.0-15544363240&doi=10.1143%2fJJAP.44.365&partnerID=40&md5=80ec9302d76fd100714fabd354c89eae https://scholars.lib.ntu.edu.tw/handle/123456789/616390 |
ISSN: | 00214922 | DOI: | 10.1143/JJAP.44.365 | SDG/關鍵字: | Catalysts;Electric fields;Indium compounds;Optimization;Photolithography;Plasma enhanced chemical vapor deposition;Scanning electron microscopy;Silicon compounds;Synthesis (chemical);Thin films;Density control of CNT;Inactive thin-film layers;Microwave plasma-enhanced chemical vapor deposition (MPCVD);Plasma treatment;Carbon nanotubes |
顯示於: | 凝態科學研究中心 |
在 IR 系統中的文件,除了特別指名其著作權條款之外,均受到著作權保護,並且保留所有的權利。