https://scholars.lib.ntu.edu.tw/handle/123456789/63453
Title: | IC製程用193nm光阻劑之製備及微影性質研究 | Authors: | 柯正達 傅士奇 謝國煌 |
Issue Date: | 2002 | Start page/Pages: | 67-83 | Source: | 台大工程學刊,84: | URI: | http://ntur.lib.ntu.edu.tw//handle/246246/87330 |
Appears in Collections: | 化學工程學系 |
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