https://scholars.lib.ntu.edu.tw/handle/123456789/64349
Title: | 深次微米半導體化學機械研磨技術之研究─子計畫二:化學機械研磨液穩定性之探討(2/2) Stability of Slurry in Chemical Mechanical Polishing(2/2) |
Authors: | 徐治平 | Keywords: | 氧化鐵粒子;橢球;操作條件;臨界凝聚濃度;Scholze-Hardy法則;Ferric oxide particles;spheroids;effect of operation conditions;critical coagulation concentration;Schulze-Hardy rule | Issue Date: | 2001 | Publisher: | 臺北市:國立臺灣大學化學工程學系暨研究所 | URI: | http://ntur.lib.ntu.edu.tw//handle/246246/9259 | Other Identifiers: | 892214E002049 | Rights: | 國立臺灣大學化學工程學系暨研究所 |
Appears in Collections: | 化學工程學系 |
File | Description | Size | Format | |
---|---|---|---|---|
892214E002049.pdf | 527.68 kB | Adobe PDF | View/Open |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.