https://scholars.lib.ntu.edu.tw/handle/123456789/64932
標題: | 由Poly(silsesquioxanes)及雙親性嵌段共聚物或有機非溶劑製備低介電常數奈米孔洞薄膜 Preparation of Low Dielectric Constant Nanoporous Films from Poly(Silsesquioxane) with Amphiphilic Block Copolymers or Organic Non-solvent |
作者: | 陳文章 | 關鍵字: | 雙親性嵌段共聚高分子;聚甲基倍 半矽氧烷薄膜;氫鍵;相容性;孔洞;amphiphilic block copolymer;poly(methyl silsesquioxane) film;hydrogen bonding;miscibility;pore | 公開日期: | 6-十月-2004 | 出版社: | 臺北市:國立臺灣大學化學工程學系暨研究所 | 摘要: | 本計劃探討以雙親性嵌段共聚物 PS-b-P2VP 及PS-b-PAA 製備奈米空洞 Poly(methyl silsesquioxanes)(MSSQ)薄 膜。以FTIR 、MDSC 、TGA 、TEM 研究其氫鍵形 式、空洞生成劑含量對於奈米孔洞MSSQ 薄膜 光電性質的影響。結果發現PS-b-PAA 會因為 分子內氫鍵而形成較大的分相凝聚,無法形 成奈米孔洞,而PS-b-P2VP 和MSSQ 之間的分 子間氫鍵,幫助共聚物均勻分散在MSSQ 薄膜 中,經高溫裂解後留下直徑約10 nm 的孔洞。 藉由調控空洞生成劑的含量,MSSQ 薄膜折射 率可控制在1.361 ~1.111 ,介電常數可控 制在2.67 ~1.30 。本研究並由有機與無機 之相容性探討孔洞形成機制。 In this study, nanoporous films were prepared from poly(methyl silsesquioxane) (MSSQ) by the templating of amphiphilic block copolymers, poly(styrene-b-2-vinylpyridine) (PS-b-P2VP) and poly(styrene-b-acrylic acid) (PS-b-PAA). The intermolecular hydrogen bonding interaction between the MSSQ and PS-b-P2VP prevented the aggregation of the porogens before curing, which was supported from the results of FTIR, MDSC and molecular simulation. The pore size of the nanoporous MSSQ thin films through the templating of the PS-b-P2VP was less than 10 nm from the TEM characterization, which was close to the porogen size. However, the experimental results suggested that the both intermolecular and intramolecular hydrogen bonding existed in the system of the MSSQ/PS-b-PAA hybrid. Thus, a macrophase separation was occurred in the MSSQ/PS-b-PAA hybrid and resulted in non-uniform nanopores after pyrolysis. The refractive index and dielectric constant of the prepared nanoporous films could be tuned in the range of 1.361 ~ 1.111 and 2.67 ~ 1.30, respectively, by varying the porogen ratio. The porous formation mechanism was proposed through the miscibility between organic/inorganic moieties. |
URI: | http://ntur.lib.ntu.edu.tw//handle/246246/9395 | 其他識別: | 922216E002010 | Rights: | 國立臺灣大學化學工程學系暨研究所 |
顯示於: | 化學工程學系 |
檔案 | 描述 | 大小 | 格式 | |
---|---|---|---|---|
922216E002010.pdf | 135.1 kB | Adobe PDF | 檢視/開啟 |
在 IR 系統中的文件,除了特別指名其著作權條款之外,均受到著作權保護,並且保留所有的權利。