公開日期 | 標題 | 作者 | 來源出版物 | scopus | WOS | 全文 |
---|---|---|---|---|---|---|
2019 | Accuracy improvement of electrical characteristics estimation for sub-20nm FDSOI devices with non-rectangular gates | Jia-Syun Cai; Sheng-Wei Chien; Xin-Yang Zheng; Chien-Lin Lee; KUEN-YU TSAI | Proceedings of SPIE - The International Society for Optical Engineering | 1 | 0 | |
2018 | Characterization of proximity effects in helium ion beam lithography by direct Monte Carlo simulation and resist calibration | Chien-Lin Lee; Sheng-Wei Chien; Kuen-Yu Tsai*; KUEN-YU TSAI | The 31th International Microprocesses and Nanotechnology Conference (MNC 2018) | |||
2017 | Fabrication of metrology test structures with helium ion beam direct write | Chien-Lin Lee; Sheng-Wei Chien; Sheng-Yung Chen; Chun-Hung Liu; Kuen-Yu Tsai*; Jia-Han Li; Bor-Yuan Shew; Chit-Sung Hong; Chao-Te Lee; JIA-HAN LI | Advanced Lithography 2017 - Proceedings of SPIE | 4 | 0 | |
2017 | Fabrication of programmed defects for non-imaging EUV mask inspection by helium ion beam direct milling | Chien-Lin Lee; Sheng-Wei Chien; Kuen-Yu Tsai*; KUEN-YU TSAI | The 30th International Microprocesses and Nanotechnology Conference (MNC 2017) | |||
2018 | Focused helium ion beam applications in advanced-node nanolithography R/D | Chien-Lin Lee; Sheng-Wei Chien; Kuen-Yu Tsai*; KUEN-YU TSAI | 1st Annual Zeiss Process Control Innovations Seminar (PCIS) | |||
2017 | Heavy metal incorporated helium ion active hybrid non-chemically amplified resists: Nano-patterning with low line edge roughness | Pulikanti Guruprasad Reddy; Neha Thakur; Chien-Lin Lee; Sheng-Wei Chien; Chullikkattil P. Pradeep; Subrata Ghosh; KUEN-YU TSAI ; Kenneth E. Gonsalves | AIP Advances | 13 | 11 | |
2019 | Investigation on MBOPC convergence improvement with location-dependent correction factors aided by machine learning | Jia-Syun Cai; Sheng-Wei Chien; Chien-Lin Lee; Kuen-Yu Tsai*; James P. Shiely; Matt St. John; KUEN-YU TSAI | Proceeding of SPIE, Optical Microlithography XXXII | 1 | 0 | |
2018 | Model-based proximity effect correction for helium ion beam lithography | Chien-Lin Lee; Sheng-Wei Chien; Kuen-Yu Tsai*; KUEN-YU TSAI | Advanced Lithography 2018 -- Proc. SPIE 10584 Novel Patterning Technologies 2018 | 5 | 0 | |
2021 | Precision fabrication of EUVL programmed defects with helium ion beam patterning | Chien-Lin Lee; Jia-Syun Cai; Sheng-Wei Chien; Kuen-Yu Tsai*; Jia-Han Li; JIA-HAN LI ; KUEN-YU TSAI | J. of Micro/Nanopatterning, Materials, and Metrology | 1 | 1 | |
2018 | Simulation-based proximity effect correction for helium ion beam lithography | Chien-Lin Lee; Sheng-Wei Chien; Kuen-Yu Tsai*; KUEN-YU TSAI | International workshop on Nano/micro 2d-3d fabrication, manufacturing of electronic – biomedical devices & applications (IWNEBD) |