Issue Date | Title | Author(s) | Source | scopus | WOS | Fulltext/Archive link |
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2018 | Characterization of proximity effects in helium ion beam lithography by direct Monte Carlo simulation and resist calibration | Chien-Lin Lee; Sheng-Wei Chien; Kuen-Yu Tsai*; KUEN-YU TSAI | The 31th International Microprocesses and Nanotechnology Conference (MNC 2018) | |||
2004 | DQIT: μ-synthesis without D-scale fitting | Kuen-Yu Tsai*; Haitham A. Hindi; KUEN-YU TSAI | IEEE Transactions on Automatic Control | 1 | 0 | |
2009 | Effects of Fresnel zone plate fabrication errors on focusing performances | Ting-Hang Pei; Kuen-Yu Tsai*; JIA-HAN LI | 22nd International Microprocesses and Nanotechnology Conference (MNC 2009), | |||
2017 | Fabrication of metrology test structures with helium ion beam direct write | Chien-Lin Lee; Sheng-Wei Chien; Sheng-Yung Chen; Chun-Hung Liu; Kuen-Yu Tsai*; Jia-Han Li; Bor-Yuan Shew; Chit-Sung Hong; Chao-Te Lee; JIA-HAN LI | Advanced Lithography 2017 - Proceedings of SPIE | 4 | 0 | |
2016 | Fabrication of metrology test structures with programmed imperfection using helium ion beam direct write | Sheng-Wei Chien; Kuen-Yu Tsai*; Jia-Han Li; KUEN-YU TSAI | 2016 ZEISS Korea Microscopy Workshop | |||
2017 | Fabrication of programmed defects for non-imaging EUV mask inspection by helium ion beam direct milling | Chien-Lin Lee; Sheng-Wei Chien; Kuen-Yu Tsai*; KUEN-YU TSAI | The 30th International Microprocesses and Nanotechnology Conference (MNC 2017) | |||
2018 | Focused helium ion beam applications in advanced-node nanolithography R/D | Chien-Lin Lee; Sheng-Wei Chien; Kuen-Yu Tsai*; KUEN-YU TSAI | 1st Annual Zeiss Process Control Innovations Seminar (PCIS) | |||
2019 | Investigation on MBOPC convergence improvement with location-dependent correction factors aided by machine learning | Jia-Syun Cai; Sheng-Wei Chien; Chien-Lin Lee; Kuen-Yu Tsai*; James P. Shiely; Matt St. John; KUEN-YU TSAI | Proceeding of SPIE, Optical Microlithography XXXII | 1 | 0 | |
2017 | Method and System for Establishing Parametric Model (參數化模型的建立方法及系統) | Kuen-Yu Tsai*; Chun-Hung Liu (National Taiwan University/Taiwan Semiconductor Manufacturing Company); KUEN-YU TSAI | ||||
2017 | Method for calibrating a Manufacturing process model | Kuen-Yu Tsai*; Alek C. Chen; JIA-HAN LI | ||||
2017 | Method for Calibrating A Manufacturing Process Model | Kuen-Yu Tsai*; Alek C. Chen; Jia-Han Li (National Taiwan University/ASML Netherlands B.V.); KUEN-YU TSAI | ||||
2018 | Model-based proximity effect correction for helium ion beam lithography | Chien-Lin Lee; Sheng-Wei Chien; Kuen-Yu Tsai*; KUEN-YU TSAI | Advanced Lithography 2018 -- Proc. SPIE 10584 Novel Patterning Technologies 2018 | 5 | 0 | |
2021 | Precision fabrication of EUVL programmed defects with helium ion beam patterning | Chien-Lin Lee; Jia-Syun Cai; Sheng-Wei Chien; Kuen-Yu Tsai*; Jia-Han Li; JIA-HAN LI ; KUEN-YU TSAI | J. of Micro/Nanopatterning, Materials, and Metrology | 1 | 1 | |
2016 | Process for Fabricating Integrated Circuit (積體電路的製程) | Kuen-Yu Tsai*; Min-Jang Chen; Samuel C. Pan (National Taiwan University/Taiwan Semiconductor Manufacturing Company); KUEN-YU TSAI | ||||
2017 | Projection Patterning With Exposure Mask | Kuen-Yu Tsai*; Miin-Jang Chen; Si-Chen Lee (National Taiwan University/Taiwan Semiconductor Manufacturing Company); KUEN-YU TSAI | ||||
2008 | Simulation and fabrication results of electron optical systems for massively parallel maskless lithography | Hoi-Tou Ng; Chien-Chieh Huang; Hsing-Hong Chen; Shin-Chuan Chen; Ken-Hsien Hsieh; Kuen-Yu Tsai*; JIA-HAN LI | Simulation and fabrication results of electron optical systems for massively parallel maskless lithography | |||
2018 | Simulation-based proximity effect correction for helium ion beam lithography | Chien-Lin Lee; Sheng-Wei Chien; Kuen-Yu Tsai*; KUEN-YU TSAI | International workshop on Nano/micro 2d-3d fabrication, manufacturing of electronic – biomedical devices & applications (IWNEBD) |