Issue Date | Title | Author(s) | Source | scopus | WOS | Fulltext/Archive link |
---|---|---|---|---|---|---|
1999 | Run-to-run control of CMP process considering aging effects of pad and disc | Chen, Argon ; Guo, Ruey-Shan ; Chou, Y.L.; Lin, C.L.; Dun, Jowei; ARGON CHEN | Semiconductor Manufacturing Conference Proceedings, 1999 IEEE International Symposium on | 6 | 0 |