Issue Date | Title | Author(s) | Source | scopus | WOS | Fulltext/Archive link |
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2015 | Zr?VTi?VNi thin film metallic glass as a diffusion barrier between copper and silicon | Wang C.-W.; Yiu P.; Chu J.P.; Shek C.-H.; Hsueh C.-H.; CHUN-HWAY HSUEH | Journal of Materials Science |