公開日期 | 標題 | 作者 | 來源出版物 | scopus | WOS | 全文 |
---|---|---|---|---|---|---|
2011 | Non-delta-chrome optical proximity correction methodology for process models with three-dimensional mask effects | Philip C. W. Ng; Kuen-Yu Tsai; Lawrence S. Melvin III; KUEN-YU TSAI | Journal of Micro/Nanolithography, MEMS, and MOEMS | 5 | 5 | |
2013 | Study of etching bias modeling and correction strategies for compensation of patterning process effects | Philip C. W. Ng; Kuen-Yu Tsai; Lawrence S. Melvin III; KUEN-YU TSAI | Microelectronic Engineering | 1 | 1 | |
2012 | Study of etching bias modeling and correction strategies for patterning processes | Philip C.W. Ng; Kuen-Yu Tsai; Lawrence S. Melvin III; KUEN-YU TSAI | 38th International Micro & Nano Engineering Conference (MNE 2012) |