Issue Date | Title | Author(s) | Source | scopus | WOS | Fulltext/Archive link |
---|---|---|---|---|---|---|
2007 | Real-time spatial control of photoresist development rate | Arthur Tay; Weng-Khuen Ho; Ni Hu; Choon-Meng Kiew; Kuen-Yu Tsai; KUEN-YU TSAI | Proc. SPIE , Metrology, Inspection, and Process Control for Microlithography | 0 | 0 | |
2006 | Real-time spatial control of steady-state wafer temperature during thermal processing in microlithography | Arthur Tay; Weng-Khuen Ho; Ni Hu; Kuen-Yu Tsai; Ying Zhou; KUEN-YU TSAI | Proc. SPIE, Data Analysis and Modeling for Process Control II | 0 | 0 |