公開日期 | 標題 | 作者 | 來源出版物 | scopus | WOS | 全文 |
---|---|---|---|---|---|---|
2010 | Model-based proximity effect correction for electron-beam direct-write lithography | Chun-Hung Liu; Pei-Lin Tien; Philip C. W. Ng; Yu-Tian Shen; Kuen-Yu Tsai; KUEN-YU TSAI | Advanced Lithography 2010 -- Proc. SPIE 7637, Alternative Lithographic Technologies II | 7 | 0 | |
2012 | New method of optimizing writing parameters in electron beam lithography systems for throughput improvement considering patterning fidelity constraints | Hoi-Tou Ng; Yu-Tian Shen; Sheng-Yung Chen; Chun-Hung Liu; Philip C. W. Ng; Kuen-Yu Tsai; KUEN-YU TSAI | Journal of Micro/Nanolithography, MEMS, and MOEMS | 0 | 5 | |
2011 | Non-delta-chrome optical proximity correction methodology for process models with three-dimensional mask effects | Philip C. W. Ng; Kuen-Yu Tsai; Lawrence S. Melvin III; KUEN-YU TSAI | Journal of Micro/Nanolithography, MEMS, and MOEMS | 5 | 5 | |
2013 | Study of etching bias modeling and correction strategies for compensation of patterning process effects | Philip C. W. Ng; Kuen-Yu Tsai; Lawrence S. Melvin III; KUEN-YU TSAI | Microelectronic Engineering | 1 | 1 | |
2009 | Using transmission line theory to calculate equivalent refractive index of EUV mask multilayer structures for efficient scattering simulation by finite-difference time-domain method | Yen-Min Lee; Jia-Han Li; Philip C. W. Ng; Ting-Han Pei; Fu-Min Wang; Kuen-Yu Tsai; KUEN-YU TSAI ; JIA-HAN LI | Lithography Asia 2009, Proc. SPIE | 0 | 0 |