公開日期 | 標題 | 作者 | 來源出版物 | scopus | WOS | 全文 |
2009 | Characterization of dressing behaviors and optimization technique in chemical mechanical polishing | Chen, K.R.; Young, H.T.; Chen, K.R.; Young, H.T.; HONG-TSU YOUNG | ECS Transactions | | | |
2010 | Does the Residual Stress of Backend Grinding Dominate the Warping Problems in Wafer Thinning Process | Chen, K.R.; Young, H.T.; HONG-TSU YOUNG | | | | |
2009 | Estimation of dressing effects in chemical mechanical polishing with sorts of diamond dressers | Chen, K.-R.; Young, H.-T.; Chen, K.R.; HONG-TSU YOUNG | Advanced Materials Research | 3 | 0 | |
2009 | Modeling on Dressing Effects in Chemical Mechanical Polishing with Diamond Dressers | Chen, K.R.; Young, H.T. | International Journal of Abrasive Technology | | | |
2010 | Modeling on Dressing Effects in Chemical Mechanical Polishing with Diamond Dressers | Chen, K.R.; Young, H.T.; HONG-TSU YOUNG | Int. J. of Abrasive Technology | | | |
1986 | Study of a Noise Amplification Mechanism in Gryrotrons | Chen, K.R.; Chu, K.R.; KWO-RAY CHU | IEEE Transactions on Microwave Theory and Techniques | 37 | 0 | |