公開日期 | 標題 | 作者 | 來源出版物 | scopus | WOS | 全文 |
2003 | Enhance Extreme UltraViolet Lithography mask inspection contrast by using Fabry-Perot type antireflective coatings | Cheng, H.C.; Chen, H.L.; Ko, T.S.; Lai, L.J.; Ko, F.H.; Chu, T.C.; HSUEN-LI CHEN | Digest of Papers - Microprocesses and Nanotechnology 2003 - 2003 International Microprocesses and Nanotechnology Conference, MNC 2003 | | | |
2004 | High reflectance of reflective-type attenuated-phase-shifting masks for extreme ultraviolet lithography with high inspection contrast in deep ultraviolet regimes | Chen, H.L.; Cheng, H.C.; Ko, T.S.; Ko, F.H.; Chu, T.C.; HSUEN-LI CHEN | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures | | | |
2004 | Low-temperature growth of germanium quantum dots on Silicon Oxide by inductively coupled plasma CVD | Shieh, J.; Ko, T.S.; Chen, H.L.; Dai, B.T.; Chu, T.C.; HSUEN-LI CHEN | Chemical Vapor Deposition | | | |
2004 | Nanoparticle-assisted growth of porous germanium thin films | Shieh, J.; Chen, H.L.; Ko, T.S.; Cheng, H.C.; Chu, T.C.; HSUEN-LI CHEN | Advanced Materials | | | |