High reflectance of reflective-type attenuated-phase-shifting masks for extreme ultraviolet lithography with high inspection contrast in deep ultraviolet regimes

Journal

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Journal Volume

22

Journal Issue

6

Pages

3049-3052

Date Issued

2004

Author(s)

Chen, H.L.

Cheng, H.C.

Ko, T.S.

Ko, F.H.

Chu, T.C.

DOI

URI

URL

Type

conference paper