Issue Date | Title | Author(s) | Source | scopus | WOS | Fulltext/Archive link |
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2010 | Halo profile engineering to reduce Vt fluctuation in high-K/metal-gate nMOSFET | CHEE-WEE LIU ; Chen, W.-Y.; Yu, T.-H.; Ohtou, T.; Sheu, Y.-M.; Wu, J.; CHEE-WEE LIU | International Conference on Simulation of Semiconductor Processes and Devices, SISPAD |