Patterning of nanoscale Si lines using e-beam lithography and high-selectivity plasma etching

Journal

2002 International Microprocesses and Nanotechnology Conference, MNC 2002

Pages

120-121

Date Issued

2002

Author(s)

Hou, F.-J.

Lin, H.-C.

Chen, H.-L.

Liu, J.-T.

Pan, C.-T.

Ko, F.-H.

Wang, M.-F.

Huang, T.-Y.

DOI

10.1109/IMNC.2002.1178573

URI

https://scholars.lib.ntu.edu.tw/handle/123456789/491390

URL

https://www.scopus.com/inward/record.uri?eid=2-s2.0-84960406275&doi=10.1109%2fIMNC.2002.1178573&partnerID=40&md5=a2b800d6c16abd5e5af212328a9dd1c9

Type

conference paper