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College of Engineering / 工學院
Chemical Engineering / 化學工程學系
Fluorocarbon Films Deposited by c-C4F8/N2/Ar Plasmas: The Effect of N2-addition on Gas Phase Kinetics and Surface Chemistry
Details
Fluorocarbon Films Deposited by c-C4F8/N2/Ar Plasmas: The Effect of N2-addition on Gas Phase Kinetics and Surface Chemistry
Date Issued
2013
Author(s)
P. K. Kao
C. C. Hsu
URI
https://scholars.lib.ntu.edu.tw/handle/123456789/409166
Event(s)
AVS 60th International Symposium, Long Beach, CA, USA, Oct, 2013.AVS
Description
Poster
Type
conference poster