Publication:
Novel fabrication of Si thin film for solar cell applications

cris.lastimport.scopus2025-05-09T22:52:20Z
cris.virtual.departmentPhotonics and Optoelectronicsen_US
cris.virtual.departmentElectrical Engineeringen_US
cris.virtual.departmentElectronics Engineeringen_US
cris.virtual.orcid0000-0003-3787-2163en_US
cris.virtualsource.department7818eec7-1f9c-44f7-9973-e5ec2d50a712
cris.virtualsource.department7818eec7-1f9c-44f7-9973-e5ec2d50a712
cris.virtualsource.department7818eec7-1f9c-44f7-9973-e5ec2d50a712
cris.virtualsource.orcid7818eec7-1f9c-44f7-9973-e5ec2d50a712
dc.contributor.authorLiu, C.-T.en_US
dc.contributor.authorThiyagu, S.en_US
dc.contributor.authorHsueh, C.-C.en_US
dc.contributor.authorSyu, H.-J.en_US
dc.contributor.authorYang, S.-T.en_US
dc.contributor.authorCHING-FUH LINen_US
dc.date.accessioned2018-09-10T14:57:36Z
dc.date.available2018-09-10T14:57:36Z
dc.date.issued2014
dc.description.abstractWe demonstrate a novel method to fabricate crystalline silicon thin film for solar cell applications. It can reduce material cost and energy consumption. Here, we adopt a multi-step metal-assisted chemical etching procedure by using silver as catalyst to form silicon thin film. Through engineering the etching direction, this method provides possibility to fabricate transferable silicon thin film. Moreover, the substrate can be reused for further thin film fabrication. © 2014 IEEE.
dc.identifier.doi10.1109/PVSC.2014.6925151
dc.identifier.urihttp://www.scopus.com/inward/record.url?eid=2-s2.0-84912125959&partnerID=MN8TOARS
dc.identifier.urihttp://scholars.lib.ntu.edu.tw/handle/123456789/387118
dc.languageenen
dc.relation.ispartof2014 IEEE 40th Photovoltaic Specialist Conference, PVSC 2014en_US
dc.relation.pages1284-1286
dc.sourceAH-Scopus to ORCID
dc.subjectanisotropic etching; crystalline silicon thin film; electro-less metal deposition; isotropic etching; metal-assisted chemical etching; multi-step metal-assisted chemical etching
dc.subject.classification[SDGs]SDG7
dc.subject.otherAnisotropic etching; Deposition; Energy utilization; Fabrication; Metals; Nanocrystalline materials; Semiconductor materials; Silicon solar cells; Substrates; Thin film solar cells; Crystalline silicon thin films; Isotropic etching; Material cost; Metal deposition; Metal-assisted chemical etching; Silicon thin film; Solar-cell applications; Thin film fabrication; Thin films
dc.titleNovel fabrication of Si thin film for solar cell applications
dc.typeconference paper
dspace.entity.typePublication

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