Low alkaline contamination bottom antireflective coatings for both 193- and 157-nm lithography applications

Journal

Microelectronic Engineering

Journal Volume

67-68

Pages

312-318

Date Issued

2003

Author(s)

Chen, H.L.

Chuang, Y.F.

Lee, C.C.

Hsieh, C.I.

Ko, F.H.

DOI

10.1016/S0167-9317(03)00084-4

URI

https://scholars.lib.ntu.edu.tw/handle/123456789/497270

URL

https://www.scopus.com/inward/record.uri?eid=2-s2.0-0038359113&doi=10.1016%2fS0167-9317%2803%2900084-4&partnerID=40&md5=5875e0eb2b6a4f1a047e9d38cafd871a

Type

conference paper