Reduction in leakage current of low-temperature thin-gate oxide by repeated spike oxidation technique

Journal

IEEE Electron Device Letters

Journal Volume

23

Journal Issue

1

Pages

28-30

Date Issued

2002

Author(s)

Hong, C.-C.

Chang, C.-Y.

Lee, C.-Y.

Hwu, J.-G.

DOI

10.1109/55.974802

URI

http://www.scopus.com/inward/record.url?eid=2-s2.0-0036165638&partnerID=MN8TOARS

http://scholars.lib.ntu.edu.tw/handle/123456789/296934

Type

journal article