Development of the precision long-stroke 3-DOF nano-stage for the photonic crystal process
Journal
Proceedings of SPIE - The International Society for Optical Engineering
Journal Volume
7997
Date Issued
2011
Author(s)
Abstract
In this paper, it develops a precision long-stroke 3-DOF nano-stage for the nano photonic crystal process. It integrates a linear motor driven long-stroke stage, a piezoelectric driven three-degrees-of-freedom (3-DOF) nano stage, multi-degrees-of-freedom (MDOF) laser interferometer measurement system and their control systems. The long-stroke nano-stage is a hybrid precision stage that can provide long-stroke and high precision positioning. The common focus horizon regulation system is used to keep the parallelism between writing instrument and the target while the laser direct writing instrument is used to write the nano structure needed. Furthermore, the automatic focusing and horizon control system can compensate the defocusing and angular errors that caused by machining automatically. With this precision 3-DOF nano-stage, the laser direct writing system can improve the process speed, overcome the optical limit of interference to reduce the writing spot, generate arbitrary patterns. ? 2011 SPIE.
Subjects
Angular errors
Arbitrary patterns
Automatic focusing
Defocusing
High precision positioning
Horizon control
Laser direct writing
Laser direct writing system
Laser interferometer
Multi degrees of freedom
Nano-imprinting
Nano-precision stage
Nano-stage
Optical limits
Precision stage
Process speed
Writing instruments
Control systems
Crystal cutting
Crystal structure
Interferometers
Laser interferometry
Photonic crystals
Piezoelectric motors
Precision engineering
Type
conference paper