New CVD source reagents for osmium thin film deposition

Journal

Chemical Vapor Deposition

Journal Volume

7

Journal Issue

6

Pages

245-248

Date Issued

2001

Author(s)

Yu, H.-L.

Chi, Y.

Liu, C.-S.

Lee, G.-H.

DOI

10.1002/1521-3862(200111)7:6<245

URI

http://www.scopus.com/inward/record.url?eid=2-s2.0-0001503617&partnerID=MN8TOARS

http://scholars.lib.ntu.edu.tw/handle/123456789/292807

Type

journal article