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College of Science / 理學院
Chemistry / 化學系
New CVD source reagents for osmium thin film deposition
Details
New CVD source reagents for osmium thin film deposition
Journal
Chemical Vapor Deposition
Journal Volume
7
Journal Issue
6
Pages
245-248
Date Issued
2001
Author(s)
Yu, H.-L.
Chi, Y.
Liu, C.-S.
SHIE-MING PENG
Lee, G.-H.
DOI
10.1002/1521-3862(200111)7:6<245
URI
http://www.scopus.com/inward/record.url?eid=2-s2.0-0001503617&partnerID=MN8TOARS
http://scholars.lib.ntu.edu.tw/handle/123456789/292807
Type
journal article