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College of Engineering / 工學院
Materials Science and Engineering / 材料科學與工程學系
Charge storage characteristics of atomic layer deposited RuO<inf>x</inf> nanocrystals
Details
Charge storage characteristics of atomic layer deposited RuOx nanocrystals
Journal
Applied Physics Letters
Journal Volume
90
Journal Issue
25
Date Issued
2007
Author(s)
Maikap, S.
Wang, T.Y.
Tzeng, P.J.
Lin, C.H.
Lee, L.S.
Yang, J.R.
Tsai, M.J.
JER-REN YANG
DOI
10.1063/1.2749857
URI
https://scholars.lib.ntu.edu.tw/handle/123456789/491628
URL
https://www.scopus.com/inward/record.uri?eid=2-s2.0-34547254064&doi=10.1063%2f1.2749857&partnerID=40&md5=9df8c835d395a159f40b28b534483803
Type
journal article