Zero dipole formation at HfGdO/SiO2 interface by Hf/Gd dual-sputtered method

Journal

Journal of the Electrochemical Society

Journal Volume

158

Journal Issue

5

Date Issued

2011

Author(s)

Wang, J.-C.

Chou, P.-C.

Lai, C.-S.

Lin, J.-Y.

Chang, W.-C.

Lu, H.-C.

Wu, C.-I.

Wang, P.-S.

DOI

10.1149/1.3554738

URI

http://www.scopus.com/inward/record.url?eid=2-s2.0-79953227024&partnerID=MN8TOARS

http://scholars.lib.ntu.edu.tw/handle/123456789/365476

Type

journal article