Publication:
Lateral nonuniformity of the tunneling current of Al/SiO2/p-Si capacitor in inversion region due to edge fringing field effect

cris.lastimport.scopus2025-05-05T21:38:35Z
cris.virtual.departmentElectrical Engineeringen_US
cris.virtual.departmentElectronics Engineeringen_US
cris.virtual.orcid0000-0001-9688-0812en_US
cris.virtualsource.departmentd18091e7-be53-4dda-8b3d-eb34dffdaaa8
cris.virtualsource.departmentd18091e7-be53-4dda-8b3d-eb34dffdaaa8
cris.virtualsource.orcidd18091e7-be53-4dda-8b3d-eb34dffdaaa8
dc.contributor.authorLu, H.-W.en_US
dc.contributor.authorHwu, J.-G.en_US
dc.contributor.authorJENN-GWO HWUzz
dc.creatorLu, H.-W.;Hwu, J.-G.
dc.date.accessioned2018-09-10T09:44:19Z
dc.date.available2018-09-10T09:44:19Z
dc.date.issued2013
dc.identifier.doi10.1149/05807.0339ecst
dc.identifier.urihttp://www.scopus.com/inward/record.url?eid=2-s2.0-84904885163&partnerID=MN8TOARS
dc.identifier.urihttp://scholars.lib.ntu.edu.tw/handle/123456789/378072
dc.languageenen
dc.relation.ispartofECS Transactions
dc.relation.journalissue7
dc.relation.journalvolume58
dc.relation.pages339-344
dc.sourceAH
dc.titleLateral nonuniformity of the tunneling current of Al/SiO2/p-Si capacitor in inversion region due to edge fringing field effect
dc.typeconference paper
dspace.entity.typePublication

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