A new method to fabricate diffractive blazed gratings by an-isotropic etching on (110) silicon wafers
Journal
Proceedings of SPIE - The International Society for Optical Engineering
Journal Volume
3242
Pages
46-51
Date Issued
1997
Author(s)
Abstract
This paper describes a new method to fabricate the blazed gratings on oriented silicon by the anisotropic etching technique. Instead of making the multilevel gratings by the binary lithography or preparing the analog resist profiles by the e-beam direct-write, we propose a new sequence to obtain the blazed gratings with a continuous blaze surface. The key techniques include the oblique lapping/polishing and the time/portion control of potassium wet etching. This method has the advantages of easy facility, low cost, and large tolerance in gratings' design.
Type
conference paper