Thermally induced morphology evolution of pit-patterned Si substrate and its effect on nucleation properties of Ge dots
Journal
Nanotechnology
Journal Volume
23
Journal Issue
1
Date Issued
2012
Author(s)
CHIEH-HSIUNG KUAN
Chen, H.-M.
Kuan, C.-H.
Suen, Y.-W.
Luo, G.-L.
Lai, Y.-P.
Wang, F.-M.
Chen, S.-T.
CHIEH-HSIUNG KUAN
SDGs
Type
journal article
