A single nano-void precisely positioned in SiO2/Si substrate by focused helium ion beam technique

Journal

Vacuum

Journal Volume

152

Pages

188-192

Date Issued

2018

Author(s)

Yang, C.-W.

Chou, C.

Chen, W.-C.

DOI

10.1016/j.vacuum.2018.03.029

URI

https://scholars.lib.ntu.edu.tw/handle/123456789/500394

URL

https://www.scopus.com/inward/record.uri?eid=2-s2.0-85044455513&doi=10.1016%2fj.vacuum.2018.03.029&partnerID=40&md5=7fa7e0f426bb2e957b8d47315ec2a339

Type

journal article