Investigation of defects in ultra-thin Al 2 O 3 films deposited on pure copper by the atomic layer deposition technique

Journal

Applied Surface Science

Journal Volume

359

Pages

533-542

Date Issued

2015

Author(s)

Chang M.L.

Wang L.C.

Lin K.M.

DOI

10.1016/j.apsusc.2015.10.144

URI

https://www.scopus.com/inward/record.uri?eid=2-s2.0-84961782222&doi=10.1016%2fj.apsusc.2015.10.144&partnerID=40&md5=80df6b9520e44fa5fa423f7d99eef473

https://scholars.lib.ntu.edu.tw/handle/123456789/432421

Publisher

Elsevier B.V.

Type

journal article