Double nitridation of crystalline ZrO 2 /Al 2 O 3 buffer gate stack with high capacitance, low leakage and improved thermal stability

Journal

Applied Surface Science

Journal Volume

330

Pages

221-227

Date Issued

2015

Author(s)

Huang, J.-J.

Tsai, Y.-J.

Tsai, M.-C.

Lee, M.-H.

Chen, M.-J.

DOI

10.1016/j.apsusc.2015.01.005

URI

https://scholars.lib.ntu.edu.tw/handle/123456789/491748

URL

https://www.scopus.com/inward/record.uri?eid=2-s2.0-84924023395&doi=10.1016%2fj.apsusc.2015.01.005&partnerID=40&md5=be1591533a2f94311c83f99268fcc12e

Type

journal article