https://scholars.lib.ntu.edu.tw/handle/123456789/491748| Title: | Double nitridation of crystalline ZrO <inf>2</inf> /Al <inf>2</inf> O <inf>3</inf> buffer gate stack with high capacitance, low leakage and improved thermal stability | Authors: | Huang, J.-J. Tsai, Y.-J. Tsai, M.-C. Lee, M.-H. Chen, M.-J. MIIN-JANG CHEN |
Issue Date: | 2015 | Journal Volume: | 330 | Start page/Pages: | 221-227 | Source: | Applied Surface Science | URI: | https://scholars.lib.ntu.edu.tw/handle/123456789/491748 | DOI: | 10.1016/j.apsusc.2015.01.005 |
| Appears in Collections: | 材料科學與工程學系 |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.