Structure and tribological behavior of (AlCrNbSiTiV)N film deposited using direct current magnetron sputtering and high power impulse magnetron sputtering
Journal
Thin Solid Films
Journal Volume
668
Pages
63-68
Date Issued
2018
Author(s)
Abstract
Multi-element nitride films of AlCrNbSiTiV high-entropy alloy (HEAs) are deposited on a cermet cutter (T1200A) and glass substrates using reactive direct current magnetron sputtering (DCMS) and high power impulse magnetron sputtering (HIPIMS) with a single equimolar AlCrNbSiTiV HEA target. This study determines the effect of the ratio of the nitrogen flow (varying from 0 to 40%) on the chemical composition, microstructure, mechanical properties and cutting tool performance of the (AlCrNbSiTiV)N film. The films are found to have increased hardness and elastic recovery when the nitrogen flow ratio is increased. The (AlCrNbSiTiV)N film adheres well to the substrate and the Rockwell indentation results are HF1. (AlCrNbSiTiV)N films that are grown using DCMS and HIPIMS feature only a simple face-center-cubic structure. The samples that are deposited using HIPIMS exhibit a higher film density, a smoother surface and excellent hardness and elastic recovery, compared to coatings that are deposited using DCMS. The (AlCrNbSiTiV)N films are coated onto cutters for the dry turning of a SCM440 steel work-piece. The machining surface of a coated tool that is deposited using a HIPIMS system exhibits fewer surface defects and the tool flank wear is decreased.
Type
journal article