The retardation of aluminum-amorphous silicon interaction by phosphine plasma treatment

Journal

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Journal Volume

16

Journal Issue

2

Pages

587-589

Date Issued

1998

Author(s)

Wei, J.-H.

DOI

10.1116/1.581074

URI

https://scholars.lib.ntu.edu.tw/handle/123456789/498862

URL

https://www.scopus.com/inward/record.uri?eid=2-s2.0-0032375674&doi=10.1116%2f1.581074&partnerID=40&md5=d26f2adb8ceb97f08e9cb7179f1f1940

Type

journal article