A High ION/IOFF Ratio of 6 × 105 in Germanium-Tin n+/p Junctions by Phosphorus Ion Implantation

Journal

2019 Electron Devices Technology and Manufacturing Conference, EDTM 2019

Pages

142-144

Date Issued

2019

Author(s)

Liu, J.-Y.

Chuang, Y.

Liu, C.-Y.

Luo, G.-L.

DOI

10.1109/EDTM.2019.8731032

URI

https://scholars.lib.ntu.edu.tw/handle/123456789/498460

URL

https://www.scopus.com/inward/record.uri?eid=2-s2.0-85067820725&doi=10.1109%2fEDTM.2019.8731032&partnerID=40&md5=e774894530b77e039a2c38dd8898d020

Type

conference paper