DSA-Compliant Routing for 2-D Patterns Using Block Copolymer Lithography
Journal
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
Journal Volume
38
Journal Issue
2
Pages
267-280
Date Issued
2019
Author(s)
Su, Y.-H.
Abstract
2-D directed self-assembly (DSA) is an emerging lithography for the 5-nm process node and beyond that can substantially increase design flexibility in critical routing layers and reduce the number of cuts for better yield. The state-of-the-art 2-D DSA process manipulates the orientation of double posts inside guiding templates to guide block copolymers (BCPs) to form 2-D patterns. However, a key challenge arises on how to correctly assign double post orientations and place cut patterns to make desired net connections for a given routing instance. In this paper, we propose a novel 2-D DSA-compliant routing (2-D-DCR) framework to systematically derive feasible orientation assignments for double posts to maximize routability. Specifically, 2-D-DCR features a complete set of new routing rules which transform the underlying physical BCP growth principles for large-scale routing, adopts a network-flow-based double-post assignment routing algorithm, and leverages a 2-D DSA line-end creation property to maximally reduce line-end cuts. Experimental results show that our 2-D-DCR can effectively generate a 2-D-DCR solution with zero double post conflicts, maximized routability, and minimized the number of cuts.
Type
journal article