DSA-Compliant Routing for 2-D Patterns Using Block Copolymer Lithography

Journal

IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems

Journal Volume

38

Journal Issue

2

Pages

267-280

Date Issued

2019

Author(s)

Su, Y.-H.

DOI

10.1109/TCAD.2018.2812122

URI

https://www.scopus.com/inward/record.uri?eid=2-s2.0-85042845741&doi=10.1109%2fTCAD.2018.2812122&partnerID=40&md5=0c7d829edbf3e76e82b002ca226688e4

https://scholars.lib.ntu.edu.tw/handle/123456789/408571

Type

journal article