Efficient three-dimensional resist profile-driven source mask optimization optical proximity correction based on Abbe-principal component analysis and Sylvester equation

Journal

Journal of Micro/ Nanolithography, MEMS, and MOEMS

Journal Volume

14

Journal Issue

1

Date Issued

2015

Author(s)

Lin, P.-C.

Yu, C.-C.

CHUNG-PING CHEN

DOI

10.1117/1.JMM.14.1.011006

URI

https://scholars.lib.ntu.edu.tw/handle/123456789/501074

URL

https://www.scopus.com/inward/record.uri?eid=2-s2.0-84920681175&doi=10.1117%2f1.JMM.14.1.011006&partnerID=40&md5=9834afe0d2dffb7b77794cf88bb8912c

Type

journal article