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College of Engineering / 工學院
Materials Science and Engineering / 材料科學與工程學系
Rapidly selective growth of nanoparticles by electron-beam and optical lithographies with chemically amplified resists
Details
Rapidly selective growth of nanoparticles by electron-beam and optical lithographies with chemically amplified resists
Journal
Electrochemical and Solid-State Letters
Journal Volume
8
Journal Issue
2
Date Issued
2005
Author(s)
Chen, H.L.
Chu, Y.H.
Kuo, C.I.
Liu, F.K.
Ko, F.H.
Chu, T.C.
HSUEN-LI CHEN
DOI
10.1149/1.1845051
URI
https://scholars.lib.ntu.edu.tw/handle/123456789/491353
URL
https://www.scopus.com/inward/record.uri?eid=2-s2.0-13444270465&doi=10.1149%2f1.1845051&partnerID=40&md5=56555151a4df2a387f35a1942c6be88f
Type
journal article