Publication:
Formation of cylindrical profile of Si by KrF excimer laser system for optical interconnect

cris.lastimport.scopus2025-05-14T22:42:07Z
cris.virtual.departmentPhotonics and Optoelectronicsen_US
cris.virtual.departmentElectrical Engineeringen_US
cris.virtual.departmentElectronics Engineeringen_US
cris.virtual.orcid0000-0003-3787-2163en_US
cris.virtualsource.department7818eec7-1f9c-44f7-9973-e5ec2d50a712
cris.virtualsource.department7818eec7-1f9c-44f7-9973-e5ec2d50a712
cris.virtualsource.department7818eec7-1f9c-44f7-9973-e5ec2d50a712
cris.virtualsource.orcid7818eec7-1f9c-44f7-9973-e5ec2d50a712
dc.contributor.authorHung, S.-C.en_US
dc.contributor.authorShiu, S.-C.en_US
dc.contributor.authorChao, J.-J.en_US
dc.contributor.authorCHING-FUH LINen_US
dc.date.accessioned2018-09-10T08:42:04Z
dc.date.available2018-09-10T08:42:04Z
dc.date.issued2011
dc.identifier.doi10.1109/NANO.2011.6144570
dc.identifier.urihttp://www.scopus.com/inward/record.url?eid=2-s2.0-84858968032&partnerID=MN8TOARS
dc.identifier.urihttp://scholars.lib.ntu.edu.tw/handle/123456789/364951
dc.languageenen
dc.relation.ispartofIEEE Conference on Nanotechnologyen_US
dc.relation.pages5-8
dc.sourceAH-Scopus to ORCID
dc.titleFormation of cylindrical profile of Si by KrF excimer laser system for optical interconnect
dc.typeconference paper
dspace.entity.typePublication

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