Publication: Formation of cylindrical profile of Si by KrF excimer laser system for optical interconnect
cris.lastimport.scopus | 2025-05-14T22:42:07Z | |
cris.virtual.department | Photonics and Optoelectronics | en_US |
cris.virtual.department | Electrical Engineering | en_US |
cris.virtual.department | Electronics Engineering | en_US |
cris.virtual.orcid | 0000-0003-3787-2163 | en_US |
cris.virtualsource.department | 7818eec7-1f9c-44f7-9973-e5ec2d50a712 | |
cris.virtualsource.department | 7818eec7-1f9c-44f7-9973-e5ec2d50a712 | |
cris.virtualsource.department | 7818eec7-1f9c-44f7-9973-e5ec2d50a712 | |
cris.virtualsource.orcid | 7818eec7-1f9c-44f7-9973-e5ec2d50a712 | |
dc.contributor.author | Hung, S.-C. | en_US |
dc.contributor.author | Shiu, S.-C. | en_US |
dc.contributor.author | Chao, J.-J. | en_US |
dc.contributor.author | CHING-FUH LIN | en_US |
dc.date.accessioned | 2018-09-10T08:42:04Z | |
dc.date.available | 2018-09-10T08:42:04Z | |
dc.date.issued | 2011 | |
dc.identifier.doi | 10.1109/NANO.2011.6144570 | |
dc.identifier.uri | http://www.scopus.com/inward/record.url?eid=2-s2.0-84858968032&partnerID=MN8TOARS | |
dc.identifier.uri | http://scholars.lib.ntu.edu.tw/handle/123456789/364951 | |
dc.language | en | en |
dc.relation.ispartof | IEEE Conference on Nanotechnology | en_US |
dc.relation.pages | 5-8 | |
dc.source | AH-Scopus to ORCID | |
dc.title | Formation of cylindrical profile of Si by KrF excimer laser system for optical interconnect | |
dc.type | conference paper | |
dspace.entity.type | Publication |