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Errata: Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects

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cris.lastimport.scopus2025-04-28T22:03:32Z
cris.virtual.departmentEngineering Science and Ocean Engineeringen_US
cris.virtual.departmentElectrical Engineeringen_US
cris.virtual.departmentElectronics Engineeringen_US
cris.virtual.orcid#PLACEHOLDER_PARENT_METADATA_VALUE#
cris.virtual.orcid0000-0002-2531-1716en_US
cris.virtualsource.departmentee1320d4-773f-4997-aede-fa1589e69f35
cris.virtualsource.department3dfdfd8e-e9c8-465d-acbc-952cf547943b
cris.virtualsource.department3dfdfd8e-e9c8-465d-acbc-952cf547943b
cris.virtualsource.orcidee1320d4-773f-4997-aede-fa1589e69f35
cris.virtualsource.orcid3dfdfd8e-e9c8-465d-acbc-952cf547943b
dc.contributor.authorNg, Philip C.W.en_US
dc.contributor.authorTsai, Kuen-Yuen_US
dc.contributor.authorLee, Yen-Minen_US
dc.contributor.authorWang, Fu-Minen_US
dc.contributor.authorLi, Jia-Hanen_US
dc.contributor.authorJIA-HAN LIen_US
dc.creatorNg, Philip C.W.; Tsai, Kuen-Yu; Lee, Yen-Min; Wang, Fu-Min; Li, Jia-Han; Chen, Alek C.
dc.date2011en
dc.date.accessioned2012-10-31T09:53:11Z
dc.date.accessioned2018-06-28T21:15:36Z
dc.date.available2012-10-31T09:53:11Z
dc.date.available2018-06-28T21:15:36Z
dc.date.issued2011
dc.identifier.doi10.1117/1.3576188en
dc.identifier.urihttp://ntur.lib.ntu.edu.tw//handle/246246/244415
dc.identifier.uri.fulltexthttp://ntur.lib.ntu.edu.tw/bitstream/246246/244415/-1/50.pdf
dc.languageenen
dc.language.isoen_US
dc.relationJournal of Micro/Nanolithography, MEMS, and MOEMS, 10(2), 029801en
dc.relation.ispartofJournal of Micro/Nanolithography MEMS and MOEMSen_US
dc.relation.pages29801
dc.titleErrata: Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effectsen
dc.typejournal articleen
dspace.entity.typePublication

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