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College of Electrical Engineering and Computer Science / 電機資訊學院
Electrical Engineering / 電機工程學系
Plasma power controlled deposition of SiO<inf>x</inf> with manipulated Si quantum dot size for photoluminescent wavelength tailoring
Details
Plasma power controlled deposition of SiOx with manipulated Si quantum dot size for photoluminescent wavelength tailoring
Journal
Optics Express
Journal Volume
18
Journal Issue
5
Pages
4449-4456
Date Issued
2010
Author(s)
Lai, B.-H.
Cheng, C.-H.
Pai, Y.-H.
GONG-RU LIN
DOI
10.1364/OE.18.004449
URI
https://scholars.lib.ntu.edu.tw/handle/123456789/500130
URL
https://www.scopus.com/inward/record.uri?eid=2-s2.0-77749304266&doi=10.1364%2fOE.18.004449&partnerID=40&md5=a770992911e571994752df1ce9c947e1
Type
journal article