Characteristics of ALD high-�e HfAlOx nanocrystals in memory capacitors annealed at high temperatures

Journal

ECS Transactions

Journal Volume

33

Journal Issue

3

Pages

347-353

Date Issued

2010

Author(s)

Li, W.C.

Banerjee, W.

Maikap, S.

Yang, J.R.

DOI

10.1149/1.3481623

URI

https://scholars.lib.ntu.edu.tw/handle/123456789/491591

URL

https://www.scopus.com/inward/record.uri?eid=2-s2.0-79952658982&doi=10.1149%2f1.3481623&partnerID=40&md5=e51693a29ff69444ec7797e53a9a375c

Type

conference paper