Characteristics of plasma enhanced chemical vapor deposition-grown SiN[sub x] films prepared for deep ultraviolet attenuated phase-shifting masks

Journal

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures

Journal Volume

16

Journal Issue

6

Pages

3612

Date Issued

1998

Author(s)

Chen, H. L.

L. A. Wang

DOI

URI

URL

Type

journal article