Publication: Lateral Non-uniformity Reduction by Compensatory Metal Embedded in MOS Structure with Ultra-Thin Anodic Oxide
| cris.lastimport.scopus | 2025-05-08T22:24:56Z | |
| cris.virtual.department | Electrical Engineering | en_US |
| cris.virtual.department | Electronics Engineering | en_US |
| cris.virtual.orcid | 0000-0001-9688-0812 | en_US |
| cris.virtualsource.department | d18091e7-be53-4dda-8b3d-eb34dffdaaa8 | |
| cris.virtualsource.department | d18091e7-be53-4dda-8b3d-eb34dffdaaa8 | |
| cris.virtualsource.orcid | d18091e7-be53-4dda-8b3d-eb34dffdaaa8 | |
| dc.contributor.author | J.Y.Chen | en_US |
| dc.contributor.author | W.C.Kao | en_US |
| dc.contributor.author | J.G.Hwu* | en_US |
| dc.contributor.author | JENN-GWO HWU | en_US |
| dc.creator | JENN-GWO HWU;J.G.Hwu*;W.C.Kao;J.Y.Chen | |
| dc.date.accessioned | 2019-10-31T06:41:35Z | |
| dc.date.available | 2019-10-31T06:41:35Z | |
| dc.date.issued | 2016 | |
| dc.identifier.doi | 10.1149/07202.0097ecst | |
| dc.identifier.issn | 19386737 | |
| dc.identifier.scopus | 2-s2.0-85010705335 | |
| dc.identifier.uri | https://scholars.lib.ntu.edu.tw/handle/123456789/429065 | |
| dc.relation.ispartof | Electrochemical Society Transactions - Dielectrics for Nanosystems 7: Materials Science, Processing, Reliability, and Manufactur | |
| dc.relation.journalissue | 2 | |
| dc.relation.journalvolume | 72 | |
| dc.relation.pages | 1956-1961 | |
| dc.title | Lateral Non-uniformity Reduction by Compensatory Metal Embedded in MOS Structure with Ultra-Thin Anodic Oxide | en_US |
| dc.type | journal article | en |
| dspace.entity.type | Publication |