Electrical and optical reliability improvement of HfO<inf>2</inf> gate dielectric by deuterium and hydrogen incorporation

Journal

International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA

Pages

165-168

Date Issued

2004

Author(s)

Yu, C.-Y.

Chen, T.C.

Lee, M.H.

Huang, S.-H.

Lee, L.S.

URI

Type

conference paper