Beam drift detection using a two-dimensional electron beam position monitor system for multiple-electron-beam–direct-write lithography
Journal
The 54th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication
Pages
2-10
Date Issued
2010-06
Author(s)
Sheng-Yung Chen
Kuen-Yu Tsai
Hoi-Tou Ng
Chi-Hsiung Fan
Ting-Han Pei
Chieh-Hsiung Kuan
Yung-Yaw Chen
Yi-Hung Kuo
Cheng-Ju Wu
Jia-Yush Yen
Type
conference paper