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College of Electrical Engineering and Computer Science / 電機資訊學院
Electrical Engineering / 電機工程學系
Phase masks fabricated by interferometric lithography for working in 248 nm wavelength
Details
Phase masks fabricated by interferometric lithography for working in 248 nm wavelength
Journal
Microelectronic Engineering
Journal Volume
67-68
Pages
63-69
Date Issued
2003
Author(s)
Cheng, W.C.
Wang, L.A.
LON A. WANG
DOI
10.1016/S0167-9317(03)00060-1
URI
https://scholars.lib.ntu.edu.tw/handle/123456789/497268
URL
https://www.scopus.com/inward/record.uri?eid=2-s2.0-0038697386&doi=10.1016%2fS0167-9317%2803%2900060-1&partnerID=40&md5=73f09b7aae6ad9024bb006012aa2d50d
SDGs
[SDGs]SDG7
Type
conference paper
