Fast lithographic mask optimization considering process variation

Journal

IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems

Journal Volume

35

Journal Issue

8

Pages

1345-1357

Date Issued

2016

Author(s)

Su, Y.-H.

Huang, Y.-C.

Tsai, L.-C.

Chang, Y.-W.

Banerjee, S.

DOI

10.1109/TCAD.2015.2514082

URI

http://www.scopus.com/inward/record.url?eid=2-s2.0-84979609928&partnerID=MN8TOARS

http://scholars.lib.ntu.edu.tw/handle/123456789/396596

Type

journal article